Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering
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DOI: 10.3762/bjnano.10.149
Abstract: In this work, rapid thermal annealing (RTA) was applied to indium tin oxide (ITO) films in ambient atmosphere, resulting in significant improvements of the quality of the ITO films that are commonly used as conductive… read more here.
Keywords: thin films; rapid thermal; quality ito; radio frequency ... See more keywords