Quick Cleaning Process for Silicon Carbide Chemical Vapor Deposition Reactor
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DOI: 10.1149/2.0161708jss
Abstract: A quick cleaning process was developed for a silicon carbide chemical vapor deposition reactor. For this purpose, the stability of the susceptor coating film made of pyrolytic carbon was evaluated by means of exposing it… read more here.
Keywords: carbide chemical; silicon carbide; chemical vapor; vapor deposition ... See more keywords