Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
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DOI: 10.1116/6.0000132
Abstract: This work studies the deposition of boron/boron nitride (B/BN) composite films at low substrate temperature (275–375 °C) by alternating pulses of diborane (B2H6) and ammonia (NH3) with argon purging in between to avoid gas-phase reactions of… read more here.
Keywords: radical enhanced; boron nitride; nitridation; ammonia ... See more keywords