The effect of H radicals on microstructure and electrical and optical properties of sputtered ZnO:Al films
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DOI: 10.1063/5.0041307
Abstract: ZnO:Al films were prepared by magnetron sputtering at room temperature. During the growth process, H radicals produced by radio frequency power sources were in situ introduced into ZnO:Al films. By injecting H radicals, the content… read more here.
Keywords: microstructure electrical; radicals microstructure; optical properties; electrical optical ... See more keywords