Investigation of sidewall damage induced by reactive ion etching on AlGaInP MESA for micro-LED application
Sign Up to like & getrecommendations! Published in 2021 at "Journal of Luminescence"
DOI: 10.1016/j.jlumin.2021.117937
Abstract: Abstract Previous reports have studied the impact of sidewall defects on AlGaInP micro light emitting diode (μLED) only by Current-Voltage-Luminescence (I-V-L) measurements. In this work, we propose an alternative approach to investigate these defects directly… read more here.
Keywords: sidewall; reactive ion; ion etching; ion ... See more keywords
Morphologies and optical properties of black silicon by room temperature reactive ion etching
Sign Up to like & getrecommendations! Published in 2020 at "Materials Research Bulletin"
DOI: 10.1016/j.materresbull.2020.110973
Abstract: Abstract Black Silicon (BS) nanostructures fabricated by Reactive Ion Etching at Room Temperature (RT-RIE) are presented. We discuss the influence of the plasma process parameters on the silicon etching and their influence on the shape… read more here.
Keywords: reactive ion; room temperature; room; black silicon ... See more keywords
[INVITED] Sensing properties of micro-cavity in-line Mach-Zehnder interferometer enhanced by reactive ion etching
Sign Up to like & getrecommendations! Published in 2018 at "Optics and Laser Technology"
DOI: 10.1016/j.optlastec.2018.01.045
Abstract: Abstract In this work, we discuss an application of reactive ion etching (RIE) for enhancing the sensing properties of a micro-cavity in-line Mach-Zehnder interferometer (µIMZI). The µIMZI was fabricated using femtosecond laser micromachining in a… read more here.
Keywords: micro cavity; reactive ion; properties micro; cavity ... See more keywords
Preparation of composite micro/nano structure on the silicon surface by reactive ion etching: Enhanced anti-reflective and hydrophobic properties
Sign Up to like & getrecommendations! Published in 2018 at "Superlattices and Microstructures"
DOI: 10.1016/j.spmi.2018.03.035
Abstract: Abstract A silicon substrate with micro-pyramid structure (black silicon) is prepared by wet chemical etching and then subjected to reactive ion etching (RIE) in the mixed gas condition of SF6, CHF3 and He. We systematically… read more here.
Keywords: preparation composite; structure; silicon; reactive ion ... See more keywords
Optimizing reactive ion etching to remove sub-surface polishing damage on diamond
Sign Up to like & getrecommendations! Published in 2019 at "Journal of Applied Physics"
DOI: 10.1063/1.5094751
Abstract: Low defect smooth substrates are essential to achieve high quality diamond epitaxial growth and high performance devices. The optimization of the Ar/O 2/CF 4 reactive ion etching (RIE) plasma treatment for diamond substrate smoothing and… read more here.
Keywords: polishing damage; surface; process; diamond ... See more keywords
Deep reactive ion etching of cylindrical nanopores in silicon for photonic crystals
Sign Up to like & getrecommendations! Published in 2023 at "Nanotechnology"
DOI: 10.1088/1361-6528/acc034
Abstract: Periodic arrays of deep nanopores etched in silicon by deep reactive ion etching are desirable structures for photonic crystals and other nanostructures for silicon nanophotonics. Previous studies focused on realizing as deep as possible nanopores… read more here.
Keywords: ion etching; reactive ion; photonic crystals; deep reactive ... See more keywords
The effect of reactive ion etch (RIE) process conditions on ReRAM device performance
Sign Up to like & getrecommendations! Published in 2017 at "Semiconductor Science and Technology"
DOI: 10.1088/1361-6641/aa7eed
Abstract: The recent surge of research on resistive random access memory (ReRAM) devices has resulted in a wealth of different materials and fabrication approaches. In this work, we describe the performance implications of utilizing a reactive… read more here.
Keywords: ion etch; etch; performance; reactive ion ... See more keywords
Local smoothing of optical aluminum surfaces by reactive ion beam etching
Sign Up to like & getrecommendations! Published in 2020 at "Optical Engineering"
DOI: 10.1117/1.oe.59.3.035108
Abstract: Abstract. Ion beam finishing techniques are commonly used for improvement of surface error topography of optical devices. Optical aluminum surfaces after manufacturing by single-point diamond turning meet the requirements for applications in the infrared spectral… read more here.
Keywords: aluminum surfaces; reactive ion; ion; optical aluminum ... See more keywords
Modification of the n-Surface Profile of AlGaInN LEDs by Changing the Gas-Mixture Composition During Reactive Ion Etching
Sign Up to like & getrecommendations! Published in 2020 at "Semiconductors"
DOI: 10.1134/s1063782620060111
Abstract: The kind of profile produced during the reactive ion etching of AlGaInN light-emitting-diode (LED) heterostructures on the surface that became free after removal of the growth substrate is studied in relation to the composition of… read more here.
Keywords: reactive ion; gas mixture; composition; mixture ... See more keywords
Stable Cu2O Photoelectrodes by Reactive Ion Beam Sputter Deposition
Sign Up to like & getrecommendations! Published in 2018 at "Advances in Materials Science and Engineering"
DOI: 10.1155/2018/3792672
Abstract: Cu2O has been deposited on quartz substrates by reactive ion beam sputter deposition. Experimental results show that by controlling argon/oxygen flow rates, both n-type and p-type Cu2O samples can be achieved. The bandgap of n-type… read more here.
Keywords: sputter deposition; ion beam; cu2o; beam sputter ... See more keywords
Fabrication of a fractal pattern device for focus characterizations of X-ray imaging systems by Si deep reactive ion etching and bottom-up Au electroplating.
Sign Up to like & getrecommendations! Published in 2022 at "Applied optics"
DOI: 10.1364/ao.456427
Abstract: Precisely aligned optical components are crucial prerequisites for X-ray tomography at high resolution. We propose a device with a fractal pattern for precise automatic focusing. The device is etched in a Si substrate by deep… read more here.
Keywords: ion etching; fractal pattern; bottom electroplating; reactive ion ... See more keywords