Redistribution of Erbium and Oxygen Recoil Atoms and the Structure of Silicon Thin Surface Layers Formed by High-Dose Argon Implantation through Er and SiO2 Surface Films
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DOI: 10.1134/s1063782618130055
Abstract: Using analytical high-resolution electron microscopy, the Si structure and the redistribution of Er and O recoil atoms embedded in thin (~10 nm) surface layers by Ar+ implantation with an energy of 250–290 keV and a dose… read more here.
Keywords: surface; thin surface; recoil atoms; surface layers ... See more keywords