Study of Infra-red Spectroscopy on Bonding Environment and Structural Properties of Nanocrystalline Silicon Thin Films Grown by VHF-PECVD Process
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DOI: 10.1007/s12633-018-0008-9
Abstract: Infra-red spectroscopy as an effective tool used to establish platelet like configuration in nanocrystalline silicon thin films (nc-Si:H). These films were deposited using 60 MHz assisted very high frequency plasma enhanced chemical vapor deposition process… read more here.
Keywords: microscopy; infra red; red spectroscopy; spectroscopy ... See more keywords