Application of Amorphous Zirconium-Yttrium-Aluminum-Magnesium-Oxide Thin Film with a High Relative Dielectric Constant Prepared by Spin-Coating
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DOI: 10.3390/membranes11080608
Abstract: Amorphous metal oxide has been a popular choice for thin film material in recent years due to its high uniformity. The dielectric layer is one of the core materials of the thin film transistor (TFT),… read more here.
Keywords: high relative; relative dielectric; thin film; dielectric constant ... See more keywords