Articles with "reliability characteristics" as a keyword



Effects of fluorine based double plasma treatment on electrical and reliability characteristics of Ge pMOSFETs

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Published in 2019 at "Microelectronic Engineering"

DOI: 10.1016/j.mee.2019.111025

Abstract: Abstract In order to reduce bombardment or chemical etching damage of Ge pMOSFET treated by F-based plasma, an additional O2 or/and N2 plasma treatment was applied on the high-k gate dielectric in this work. The… read more here.

Keywords: based double; double plasma; reliability characteristics; plasma treatment ... See more keywords
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Radiation effects and reliability characteristics of Ge pMOSFETs

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Published in 2019 at "Microelectronic Engineering"

DOI: 10.1016/j.mee.2019.111034

Abstract: Abstract Germanium (Ge) is a promising channel material to replace silicon (Si) for the sub-10 nm CMOS technology node. However, the realization of Ge-based MOSFET may be limited by its poor reliability characteristics. In addition, radiation… read more here.

Keywords: radiation effects; radiation; effects reliability; radiation exposure ... See more keywords
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Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H 2 and NH 3 plasma treated interfacial layers

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Published in 2017 at "Vacuum"

DOI: 10.1016/j.vacuum.2016.10.004

Abstract: Abstract Electrical and reliability characteristics of Ge pMOSFETs with H 2 , NH 3 and NH 3 +H 2 plasma treatments were studied in this work. The GeO x interfacial layer (IL) formation and HfON… read more here.

Keywords: electrical reliability; reliability characteristics; plasma treatment; plasma treatments ... See more keywords
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Reliability Characteristics of Metal-Insulator-Semiconductor Capacitors with Low-Dielectric-Constant Materials

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Published in 2023 at "Molecules"

DOI: 10.3390/molecules28031134

Abstract: In this study, the reliability characteristics of metal-insulator-semiconductor (MIS) capacitor structures with low-dielectric-constant (low-k) materials have been investigated in terms of metal gate area and geometry and thickness of dielectric film effects. Two low-k materials,… read more here.

Keywords: low dielectric; characteristics metal; insulator semiconductor; metal insulator ... See more keywords