Analysis of grain size in FePt films fabricated using remote plasma deposition
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Magnetism and Magnetic Materials"
DOI: 10.1016/j.jmmm.2017.07.057
Abstract: Abstract Remote plasma sputtering (RPS) offers a high degree of control over the sputtering parameters used to deposit thin metallic films and has demonstrated a capability to control the media grain size distribution. Narrow grain… read more here.
Keywords: remote plasma; size; grain size; size fept ... See more keywords
Rapid thermal processing of hafnium dioxide thin films by remote plasma atomic layer deposition as high-k dielectrics
Sign Up to like & getrecommendations! Published in 2018 at "Thin Solid Films"
DOI: 10.1016/j.tsf.2018.03.055
Abstract: Abstract Hafnium oxide (HfO2) thin films have received significant attention due to its excellent properties, such as large band gap, good thermodynamic stability, high density and high dielectric constant. The post-annealing temperature is also essential… read more here.
Keywords: thin films; plasma atomic; atomic layer; remote plasma ... See more keywords
Transformer coupled toroidal wave-heated remote plasma sources operating in Ar/NF3 mixtures
Sign Up to like & getrecommendations! Published in 2024 at "Journal of Physics D: Applied Physics"
DOI: 10.1088/1361-6463/ad660f
Abstract: Remote plasmas are used in semiconductor device manufacturing as sources of radicals for chamber cleaning and isotropic etching. In these applications, large fluxes of neutral radicals (e.g. F, O, Cl, H) are desired with there… read more here.
Keywords: nf3 mixtures; transformer coupled; remote plasma; plasma ... See more keywords
Insights to scaling remote plasma sources sustained in NF3 mixtures
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Vacuum Science and Technology"
DOI: 10.1116/1.4978551
Abstract: Remote plasma sources (RPSs) are being developed for low damage materials processing during semiconductor fabrication. Plasmas sustained in NF3 are often used as a source of F atoms. NF3 containing gas mixtures such as NF3/O2… read more here.
Keywords: sustained nf3; remote plasma; insights scaling; scaling remote ... See more keywords
Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
Sign Up to like & getrecommendations! Published in 2019 at "Applied Sciences"
DOI: 10.3390/app9173531
Abstract: Silicon nitride (SiNx) thin films using 1,3-di-isopropylamino-2,4-dimethylcyclosilazane (CSN-2) and N2 plasma were investigated. The growth rate of SiNx thin films was saturated in the range of 200–500 °C, yielding approximately 0.38 Å/cycle, and featuring a… read more here.
Keywords: plasma; sinx; step; remote plasma ... See more keywords
Remote Plasma-Induced Synthesis of Self-Assembled MoS2/Carbon Nanowall Nanocomposites and Their Application as High-Performance Active Materials for Supercapacitors
Sign Up to like & getrecommendations! Published in 2022 at "Nanomaterials"
DOI: 10.3390/nano12081338
Abstract: The objective of this study is to investigate the synthesis and influence of MoS2 on carbon nanowalls (CNWs) as supercapacitor electrodes. The synthesis of MoS2 on CNW was achieved by the introduction of hydrogen remote… read more here.
Keywords: mos2 carbon; remote plasma; synthesis; plasma ... See more keywords