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Published in 2017 at "Journal of Magnetism and Magnetic Materials"
DOI: 10.1016/j.jmmm.2017.07.057
Abstract: Abstract Remote plasma sputtering (RPS) offers a high degree of control over the sputtering parameters used to deposit thin metallic films and has demonstrated a capability to control the media grain size distribution. Narrow grain…
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Keywords:
remote plasma;
size;
grain size;
size fept ... See more keywords
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Published in 2018 at "Thin Solid Films"
DOI: 10.1016/j.tsf.2018.03.055
Abstract: Abstract Hafnium oxide (HfO2) thin films have received significant attention due to its excellent properties, such as large band gap, good thermodynamic stability, high density and high dielectric constant. The post-annealing temperature is also essential…
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Keywords:
thin films;
plasma atomic;
atomic layer;
remote plasma ... See more keywords
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Published in 2017 at "Journal of Vacuum Science and Technology"
DOI: 10.1116/1.4978551
Abstract: Remote plasma sources (RPSs) are being developed for low damage materials processing during semiconductor fabrication. Plasmas sustained in NF3 are often used as a source of F atoms. NF3 containing gas mixtures such as NF3/O2…
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Keywords:
sustained nf3;
remote plasma;
insights scaling;
scaling remote ... See more keywords
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Published in 2019 at "Applied Sciences"
DOI: 10.3390/app9173531
Abstract: Silicon nitride (SiNx) thin films using 1,3-di-isopropylamino-2,4-dimethylcyclosilazane (CSN-2) and N2 plasma were investigated. The growth rate of SiNx thin films was saturated in the range of 200–500 °C, yielding approximately 0.38 Å/cycle, and featuring a…
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Keywords:
plasma;
sinx;
step;
remote plasma ... See more keywords
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Published in 2022 at "Nanomaterials"
DOI: 10.3390/nano12081338
Abstract: The objective of this study is to investigate the synthesis and influence of MoS2 on carbon nanowalls (CNWs) as supercapacitor electrodes. The synthesis of MoS2 on CNW was achieved by the introduction of hydrogen remote…
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Keywords:
mos2 carbon;
remote plasma;
synthesis;
plasma ... See more keywords