Articles with "residual layer" as a keyword



Tape‐Assisted Residual Layer‐Free One‐Step Nanoimprinting of High‐Index Hybrid Polymer for Optical Loss‐Suppressed Metasurfaces

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Published in 2025 at "Advanced Science"

DOI: 10.1002/advs.202409371

Abstract: The commercialization of metasurfaces is crucial for real‐world applications such as wearable sensors, pigment‐free color pixels, and augmented and virtual reality devices. Nanoparticle‐embedded resin‐based nanoimprint lithography (PER‐NIL) has shown itself to be a low‐cost, high‐throughput… read more here.

Keywords: layer; tape; high index; residual layer ... See more keywords

Tape‐Assisted Residual Layer‐Free One‐Step Nanoimprinting of High‐Index Hybrid Polymer for Optical Loss‐Suppressed Metasurfaces (Adv. Sci. 10/2025)

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Published in 2025 at "Advanced Science"

DOI: 10.1002/advs.202570061

Abstract: Tape‐Assisted Nanoimprint Lithography In article number 2409371, Junsuk Rho, Yujin Park, and co‐workers introduce a novel fabrication technique that utilizes tape to exfoliate the high‐index residual layer in particle‐embedded resinbased nanoimprint lithography. This method enables… read more here.

Keywords: tape assisted; residual layer; high index; tape ... See more keywords
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Simulating the Residual Layer Thickness in Roll-to-Plate Nanoimprinting with Tensioned Webs

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Published in 2022 at "Micromachines"

DOI: 10.3390/mi13030461

Abstract: Roll-to-plate nanoimprinting with flexible stamps is a fabrication method to pattern large-area substrates with micro- and nanotextures. The imprint consists of the preferred texture on top of a residual layer, of which the thickness and… read more here.

Keywords: layer; residual layer; layer thickness; plate nanoimprinting ... See more keywords
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Fast heterogeneous N 2 O 5 uptake and ClNO 2 production in power plant and industrial plumes observed in the nocturnal residual layer over the North China Plain

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Published in 2017 at "Atmospheric Chemistry and Physics"

DOI: 10.5194/acp-17-12361-2017

Abstract: Abstract. Dinitrogen pentoxide (N2O5) and nitryl chloride (ClNO2) are key species in nocturnal tropospheric chemistry and have significant effects on particulate nitrate formation and the following day's photochemistry through chlorine radical production and NOx recycling upon photolysis… read more here.

Keywords: residual layer; chemistry; observed nocturnal; china plain ... See more keywords