Nanoscale Resist‐Free Patterning of Halogenated Zeolitic Imidazolate Frameworks by Extreme UV Lithography
Sign Up to like & getrecommendations! Published in 2025 at "Advanced Science"
DOI: 10.1002/advs.202415804
Abstract: Advancements in patterning techniques for metal–organic frameworks (MOFs) are crucial for their integration into microelectronics. However, achieving precise nanoscale control of MOF structures remains challenging. In this work, a resist‐free method for patterning MOFs is… read more here.
Keywords: resist; nanoscale resist; resist free; free patterning ... See more keywords
How the Resist-Accept-Direct framework is being used by communities for socio-economic climate adaptation: a case study in Australia’s Murray-Darling Basin
Sign Up to like & getrecommendations! Published in 2024 at "Regional Environmental Change"
DOI: 10.1007/s10113-024-02292-7
Abstract: Globally, water governance struggles to reconcile increased demands on water resources with climate change–induced reductions in supply, making climate adaptation in water governance a pressing concern. The Resist-Accept-Direct (RAD) framework has emerged as a climate… read more here.
Keywords: adaptation; climate adaptation; resist; framework ... See more keywords
CrSb2Te thin film as a dry resist and its etching mechanism for lithography application
Sign Up to like & getrecommendations! Published in 2021 at "Materials Chemistry and Physics"
DOI: 10.1016/j.matchemphys.2021.124558
Abstract: Abstract Lithography has important applications in chip manufacturing, micro-electro-mechanical system, nanostructure fabrication, et al. Photoresist is a key factor for the lithography. However, current organic resists suffer from poor line-edge roughness, environmentally unfriendly, et al.… read more here.
Keywords: crsb2te thin; thin film; lithography; film ... See more keywords
Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography
Sign Up to like & getrecommendations! Published in 2021 at "Physical Chemistry Chemical Physics"
DOI: 10.1039/d1cp02334a
Abstract: The electron-induced chemistry of a resist material for extreme ultraviolet lithography (EUVL) consisting of Zn oxoclusters with methacrylate (MA) and trifluoroacetate (TFA) ligands (Zn(MA)(TFA)) has been studied. Electron energies of 80 eV and 20 eV… read more here.
Keywords: 320 320; irradiation; resist; chemistry ... See more keywords
A novel non-chemically amplified resist based on polystyrene-iodonium derivatives for electron beam lithography
Sign Up to like & getrecommendations! Published in 2024 at "Nanotechnology"
DOI: 10.1088/1361-6528/ad3c4c
Abstract: To break the resolution limitation of traditional resists, more work is needed on non-chemically amplified resists (non-CARs). Non-CARs based on iodonium salt modified polystyrene (PS-I) were prepared with controllable molecular weight and structure. The properties… read more here.
Keywords: resist; chemically amplified; beam lithography; non chemically ... See more keywords
Reprogramming to resist
Sign Up to like & getrecommendations! Published in 2017 at "Science"
DOI: 10.1126/science.aam5355
Abstract: Prostate cancer cells alter identity to resist therapy One means by which cancer cells evade therapies involves their ability to reprogram to a cell type that no longer depends on the cellular pathway being targeted… read more here.
Keywords: cancer; resist; reprogramming resist;
Evolution of a Biomass-Fermenting Bacterium To Resist Lignin Phenolics
Sign Up to like & getrecommendations! Published in 2017 at "Applied and Environmental Microbiology"
DOI: 10.1128/aem.00289-17
Abstract: ABSTRACT Increasing the resistance of plant-fermenting bacteria to lignocellulosic inhibitors is useful to understand microbial adaptation and to develop candidate strains for consolidated bioprocessing. Here, we study and improve inhibitor resistance in Clostridium phytofermentans (also… read more here.
Keywords: plant; fermenting bacterium; biomass; lignin ... See more keywords
Dielectric Terahertz Characterization of Microwave Substrates and Dry Resist
Sign Up to like & getrecommendations! Published in 2024 at "Crystals"
DOI: 10.3390/cryst14030205
Abstract: Microwave fabrication and design techniques are commonly employed in the terahertz (THz) domain. However, a characterization of commercially available microwave dielectric materials is usually lacking at sub-THz and THz frequencies. In this work, we characterized… read more here.
Keywords: resist; thz; loss tangent; sub thz ... See more keywords
Molecular Dynamics Study on Behavior of Resist Molecules in UV-Nanoimprint Lithography Filling Process
Sign Up to like & getrecommendations! Published in 2022 at "Nanomaterials"
DOI: 10.3390/nano12152554
Abstract: In this study, we performed molecular dynamics (MD) simulations of the filling process of few-nanometer-wide trenches with various resist materials in ultraviolet nanoimprint lithography (UV-NIL) to identify the main molecular features necessary for a successful… read more here.
Keywords: nanoimprint lithography; molecular dynamics; filling process; process ... See more keywords