CrSb2Te thin film as a dry resist and its etching mechanism for lithography application
Sign Up to like & getrecommendations! Published in 2021 at "Materials Chemistry and Physics"
DOI: 10.1016/j.matchemphys.2021.124558
Abstract: Abstract Lithography has important applications in chip manufacturing, micro-electro-mechanical system, nanostructure fabrication, et al. Photoresist is a key factor for the lithography. However, current organic resists suffer from poor line-edge roughness, environmentally unfriendly, et al.… read more here.
Keywords: crsb2te thin; thin film; lithography; film ... See more keywords
Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography
Sign Up to like & getrecommendations! Published in 2021 at "Physical Chemistry Chemical Physics"
DOI: 10.1039/d1cp02334a
Abstract: The electron-induced chemistry of a resist material for extreme ultraviolet lithography (EUVL) consisting of Zn oxoclusters with methacrylate (MA) and trifluoroacetate (TFA) ligands (Zn(MA)(TFA)) has been studied. Electron energies of 80 eV and 20 eV… read more here.
Keywords: 320 320; irradiation; resist; chemistry ... See more keywords
Reprogramming to resist
Sign Up to like & getrecommendations! Published in 2017 at "Science"
DOI: 10.1126/science.aam5355
Abstract: Prostate cancer cells alter identity to resist therapy One means by which cancer cells evade therapies involves their ability to reprogram to a cell type that no longer depends on the cellular pathway being targeted… read more here.
Keywords: cancer; resist; reprogramming resist;
Evolution of a Biomass-Fermenting Bacterium To Resist Lignin Phenolics
Sign Up to like & getrecommendations! Published in 2017 at "Applied and Environmental Microbiology"
DOI: 10.1128/aem.00289-17
Abstract: ABSTRACT Increasing the resistance of plant-fermenting bacteria to lignocellulosic inhibitors is useful to understand microbial adaptation and to develop candidate strains for consolidated bioprocessing. Here, we study and improve inhibitor resistance in Clostridium phytofermentans (also… read more here.
Keywords: plant; fermenting bacterium; biomass; lignin ... See more keywords
Molecular Dynamics Study on Behavior of Resist Molecules in UV-Nanoimprint Lithography Filling Process
Sign Up to like & getrecommendations! Published in 2022 at "Nanomaterials"
DOI: 10.3390/nano12152554
Abstract: In this study, we performed molecular dynamics (MD) simulations of the filling process of few-nanometer-wide trenches with various resist materials in ultraviolet nanoimprint lithography (UV-NIL) to identify the main molecular features necessary for a successful… read more here.
Keywords: nanoimprint lithography; molecular dynamics; filling process; process ... See more keywords