Resist-Free Lithography for Monolayer Transition Metal Dichalcogenides.
Sign Up to like & getrecommendations! Published in 2022 at "Nano letters"
DOI: 10.1021/acs.nanolett.1c04081
Abstract: Photolithography and electron-beam lithography are the most common methods for making nanoscale devices from semiconductors. While these methods are robust for bulk materials, they disturb the electrical properties of two-dimensional (2D) materials, which are highly… read more here.
Keywords: lithography; lithography monolayer; transition metal; resist free ... See more keywords
Ultrafast and Resist-Free Nanopatterning of 2D Materials by Femtosecond Laser Irradiation
Sign Up to like & getrecommendations! Published in 2023 at "ACS Nano"
DOI: 10.1021/acsnano.2c09501
Abstract: The performance of two-dimensional (2D) materials is promising for electronic, photonic, and sensing devices since they possess large surface-to-volume ratios, high mechanical strength, and broadband light sensitivity. While significant advances have been made in synthesizing… read more here.
Keywords: femtosecond laser; free nanopatterning; nanopatterning materials; ultrafast resist ... See more keywords
Resist-Free Directed Self-Assembly Chemo-Epitaxy Approach for Line/Space Patterning
Sign Up to like & getrecommendations! Published in 2020 at "Nanomaterials"
DOI: 10.3390/nano10122443
Abstract: This work reports a novel, simple, and resist-free chemo-epitaxy process permitting the directed self-assembly (DSA) of lamella polystyrene-block-polymethylmethacrylate (PS-b-PMMA) block copolymers (BCPs) on a 300 mm wafer. 193i lithography is used to manufacture topographical guiding… read more here.
Keywords: line space; self assembly; line; resist free ... See more keywords