Calibration of Compact Resist Model Through CNN Training
Sign Up to like & getrecommendations! Published in 2023 at "IEEE Transactions on Semiconductor Manufacturing"
DOI: 10.1109/tsm.2023.3267670
Abstract: We notice that the compact resist model can be mapped to a simple CNN (convolutional neural network): convolutional layer corresponds to convolutions between input images and resist kernels, and a fully connected layer can model… read more here.
Keywords: compact resist; resist model; cnn training; model ... See more keywords
Cluster sampling and scalable Bayesian optimization with constraints for negative tone development resist model calibration.
Sign Up to like & getrecommendations! Published in 2024 at "Optics express"
DOI: 10.1364/oe.518770
Abstract: As the semiconductor technology node continues to shrink, achieving smaller critical dimension in lithography becomes increasingly challenging. Negative tone development (NTD) process is widely employed in advanced node due to their large process window. However,… read more here.
Keywords: cluster sampling; model; resist model; model calibration ... See more keywords