Low Resistance TiO2/p-Si Heterojunction for Tandem Solar Cells
Sign Up to like & getrecommendations! Published in 2020 at "Materials"
DOI: 10.3390/ma13122857
Abstract: Niobium-doped titanium dioxide (Ti1−xNbxO2) films were grown on p-type Si substrates at low temperature (170 °C) using an atomic layer deposition technique. The as-deposited films were amorphous and showed low electrical conductivity. The films became… read more here.
Keywords: heterojunction tandem; low resistance; tio2 heterojunction; resistance tio2 ... See more keywords