Atomic and Electronic Structure of SiOx Films Obtained with Hydrogen Electron Cyclotron Resonance Plasma
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DOI: 10.1134/s1063776120110084
Abstract: The silicon oxide thin films obtained by thermal SiO2 treatment in hydrogen electron cyclotron resonance plasma at various exposure times are investigated. Using X-ray photoelectron spectroscopy, we have established that such treatment leads to a… read more here.
Keywords: resonance plasma; hydrogen; films obtained; electron cyclotron ... See more keywords