Source and mask optimization for stability of reticle and wafer stages.
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DOI: 10.1364/oe.535075
Abstract: The relative motion of the reticle stage and wafer stage caused by vibration during the scanning exposure process of the lithography machine is an important factor that affects the imaging quality under limited lithography ability.… read more here.
Keywords: mask optimization; reticle; stage; lithography ... See more keywords