Effects of Post-Etch Microstructures on the Optical Transmittance of Silica Ridge Waveguides
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DOI: 10.1109/jlt.2020.3012899
Abstract: Silica waveguides are often etched by reactive ion etch (RIE) processes. These processes can leave residual topography that can increase optical loss. We investigated the relation between optical loss and various RIE etch. A wet… read more here.
Keywords: silica; rie processes; optical loss; etch ... See more keywords