A high-speed exposure method for digital micromirror device based scanning maskless lithography system
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DOI: 10.1016/j.ijleo.2019.04.009
Abstract: Abstract During the process of scanning maskless lithography, exposure speed determines the efficiency and productivity of lithography fabrication. In this paper, a novel Digital Micromirror Device(DMD) based high-speed exposure method is proposed to optimize the… read more here.
Keywords: speed; maskless; method; lithography ... See more keywords