Synthesis of a Spatially Confined, Highly Durable, and Fully Exposed Pd Cluster Catalyst via Sequential Site-Selective Atomic Layer Deposition.
Sign Up to like & getrecommendations! Published in 2022 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.2c00009
Abstract: Bottom-up synthesis based on site-selective atomic layer deposition is a powerful atomic-scale processing approach to fabricate materials with desired functionalities. Typical selective atomic layer deposition (ALD) can be achieved using selective activation of a growth… read more here.
Keywords: site selective; layer deposition; atomic layer; selective atomic ... See more keywords
Area-Selective Atomic Layer Deposition on Metal/Dielectric Patterns: Amphiphobic Coating, Vaporizable Inhibitors, and Regenerative Processing.
Sign Up to like & getrecommendations! Published in 2023 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.3c03752
Abstract: Area-selective atomic layer deposition (AS-ALD) has drawn significant attention in the past decade because of the potential applications in bottom-up processing, which enables fabricating nanostructures at the atomic level without multiple patterning and lithographic processing… read more here.
Keywords: area selective; layer deposition; atomic layer; deposition ... See more keywords
Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns.
Sign Up to like & getrecommendations! Published in 2017 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.7b13365
Abstract: The reaction mechanism of area-selective atomic layer deposition (AS-ALD) of Al2O3 thin films using self-assembled monolayers (SAMs) was systematically investigated by theoretical and experimental studies. Trimethylaluminum (TMA) and H2O were used as the precursor and… read more here.
Keywords: al2o3; area selective; deposition; selective atomic ... See more keywords
Area-selective atomic layer deposition of noble metals: Polymerized fluorocarbon layers as effective growth inhibitors
Sign Up to like & getrecommendations! Published in 2021 at "Journal of Vacuum Science and Technology"
DOI: 10.1116/6.0000701
Abstract: The increasingly complex nanoscale three-dimensional and multilayered structures utilized in nanoelectronic, catalytic, and energy conversion/storage devices necessitate novel substrate-selective material deposition approaches featuring bottom-up and self-aligned precision processing. Here, we demonstrate the area-selective atomic layer… read more here.
Keywords: layer; area selective; deposition; selective atomic ... See more keywords