Effects of normal load and etching time on current evolution of scratched GaAs surface during selective etching
Sign Up to like & getrecommendations! Published in 2020 at "Materials Science in Semiconductor Processing"
DOI: 10.1016/j.mssp.2019.104744
Abstract: Abstract Structural defects on the surface of GaAs, which affect inevitably the optical and electrical properties of GaAs-based devices, are usually caused by machining, polishing, and cleaning processes. Investigating the generation and evolution of these… read more here.
Keywords: evolution; surface; normal load; selective etching ... See more keywords
Fabrication of millimeter-long structures in sapphire using femtosecond infrared laser pulses and selective etching
Sign Up to like & getrecommendations! Published in 2020 at "Optics and Lasers in Engineering"
DOI: 10.1016/j.optlaseng.2020.106114
Abstract: Abstract This paper analyzes laser and etching parameters to fabricate open and continuous microchannels and stacks of such microchannels in the bulk of crystalline sapphire (α-Al2O3). The structures are produced using a two-step method consisting… read more here.
Keywords: stacks microchannels; fabrication millimeter; laser pulses; long structures ... See more keywords
Chelation-Assisted Selective Etching Construction of Hierarchical Polyoxometalate-Based Metal–Organic Framework
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DOI: 10.1021/acs.chemmater.0c00440
Abstract: A chelation-assisted selective etching (CASE) strategy is developed to construct a hierarchical polyoxometalate-based metal–organic framework (POM@MOF). The selected chelator, ethylenediaminetetraa... read more here.
Keywords: hierarchical polyoxometalate; polyoxometalate based; chelation assisted; assisted selective ... See more keywords
Selective etching of Si, SiGe, Ge and its usage for increasing the efficiency of silicon solar cells
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DOI: 10.1134/s1063782617120028
Abstract: Dependences of the etch rates for KOH and HF:H2O2:CH3COOH solutions on SiGe layer composition were investigated. The obtained results has been proposed to use for formation of the submicron relief on the silicon surface via… read more here.
Keywords: etching sige; sige usage; selective etching; silicon ... See more keywords
Selective Etching of Si versus Si1−xGex in Tetramethyl Ammonium Hydroxide Solutions with Surfactant
Sign Up to like & getrecommendations! Published in 2022 at "Materials"
DOI: 10.3390/ma15196918
Abstract: We investigated the selective etching of Si versus Si1−xGex with various Ge concentrations (x = 0.13, 0.21, 0.30, 0.44) in tetramethyl ammonium hydroxide (TMAH) solution. Our results show that the Si1−xGex with a higher Ge… read more here.
Keywords: versus si1; etching versus; selective etching; si1 xgex ... See more keywords