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Published in 2018 at "Microsystem Technologies"
DOI: 10.1007/s00542-018-3801-x
Abstract: Diamond anvil cell techniques are now well established as a powerful and wide useful method to measure the properties of materials in the very high pressure experiment. However, the measurement of material resistance at the…
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Keywords:
diamond anvil;
pressure experiment;
shadow mask;
high pressure ... See more keywords
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Published in 2020 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.0c10189
Abstract: Single-walled carbon nanotubes (SWNTs) are incorporated in different device configurations such as chemiresistors and field-effect transistors (FETs) as a sensing element for the fabrication of highly sensitive and specific biochemical sensors. For this purpose, sorting…
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Keywords:
microscopy;
semiconducting swnts;
silicon shadow;
shadow mask ... See more keywords
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Published in 2019 at "ACS Applied Materials & Interfaces"
DOI: 10.1021/acsami.8b19410
Abstract: Single nanowires (NWs) have a broad range of applications in nanoelectronics, nanomechanics, and nanophotonics, but, to date, no technique can produce single sub-20 nm wide NWs with electrical connections in a scalable fashion. In this…
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Keywords:
single nanowire;
shadow mask;
scalable manufacturing;
lithography ... See more keywords
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Published in 2022 at "Nanotechnology"
DOI: 10.1088/1361-6528/ac55d5
Abstract: Two-dimensional (2D) materials including black phosphorus (BP) have been extensively investigated because of their exotic physical properties and potential applications in nanoelectronics and optoelectronics. Fabricating BP based devices is challenging because BP is extremely sensitive…
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Keywords:
lithography;
lithography free;
evaporation;
direct evaporation ... See more keywords
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Published in 2018 at "Journal of Microelectromechanical Systems"
DOI: 10.1109/jmems.2018.2844326
Abstract: In this paper, a reusable, flexible, and ultra-thin parylene-C/Cr shadow mask for fabricating diverse micropatterns on arbitrary surfaces is introduced. The shadow mask is composed of 3- $\mu \text{m}$ parylene-C film and 100-nm Cr layer.…
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Keywords:
mask;
thin parylene;
shadow mask;
ultra thin ... See more keywords
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Published in 2022 at "IEEE Transactions on Consumer Electronics"
DOI: 10.1109/tce.2022.3188968
Abstract: Existing shadow removal methods often struggle with two problems: color inconsistencies in shadow areas and artifacts along shadow boundaries. To address these two problems, we propose a novel shadow mask-based semantic-aware network (S2Net) that uses…
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Keywords:
based semantic;
shadow mask;
mask based;
shadow removal ... See more keywords
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Published in 2023 at "Micromachines"
DOI: 10.3390/mi14030526
Abstract: The Mo/Si multilayer mirror has been widely used in EUV astronomy, lithography, microscopy and other fields because of its high reflectivity at the wavelength around 13.5 nm. During the fabrication of Mo/Si multilayers on large,…
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Keywords:
microstructure multilayers;
mask;
multilayers deposited;
shadow mask ... See more keywords
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Published in 2022 at "Nanomaterials"
DOI: 10.3390/nano12193464
Abstract: In this article, we present a systematic investigation on a multistep nanosphere lithography technique to uncover its potential in fabricating a wide range of two- and three-dimensional nanostructures. A tilted (polar angle) electron beam shower…
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Keywords:
polar angle;
mask;
shadow mask;
mask deposition ... See more keywords