Analysis of surface adsorption kinetics of SiH4 and Si2H6 for deposition of a hydrogenated silicon thin film using intermediate pressure SiH4 plasmas
Sign Up to like & getrecommendations! Published in 2019 at "Applied Surface Science"
DOI: 10.1016/j.apsusc.2019.143728
Abstract: Abstract For the future mass production of silicon-based devices, the deposition process of hydrogenated silicon (Si:H) thin films must not only satisfy several important material properties, it must also be highly productive. Therefore, a deep… read more here.
Keywords: si2h6; surface; hydrogenated silicon; sih4 ... See more keywords
Two-dimensional fluid simulation of a radio frequency capacitively coupled plasma in SiH4/N2/O2
Sign Up to like & getrecommendations! Published in 2018 at "Physics of Plasmas"
DOI: 10.1063/1.5008586
Abstract: In plasma enhanced chemical vapor deposition, the substrate placed directly on a metallic electrode, such as an insulator, will often be processed by plasma, while it will also affect the plasma in return. In this… read more here.
Keywords: plasma; radio frequency; gas; sih4 ... See more keywords