Identification of colloidal silica polishing induced contamination in silicon
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DOI: 10.1016/j.matchar.2019.04.029
Abstract: Abstract This paper presents a multiscale characterisation approach, analysing the effect of colloidal silica polishing on crystallographic defects in multicrystalline silicon. Colloidal silica polishing for as little time as 30 min was found to significantly increase… read more here.
Keywords: silica polishing; colloidal silica; silicon; contamination ... See more keywords