Graphenic Carbon: A Novel Material to Improve the Reliability of Metal-Silicon Contacts
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DOI: 10.1109/jeds.2017.2724841
Abstract: Contact resistance and thermal degradation of metal-silicon contacts are major challenges in nanoscale CMOS as well as in power device applications. Titanium silicide (TiSi) is commonly used to establish low-barrier height contacts to silicon, in… read more here.
Keywords: barrier height; carbon; silicon contacts; metal ... See more keywords