Controlling silicon crystallization in aluminum-induced crystallization via substrate plasma treatment
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DOI: 10.1063/1.4978706
Abstract: The effect of reactive ion etching using chlorine or fluorine-based plasmas on aluminum-induced crystallization (AIC) of silicon on fused silica glass substrates was investigated with the goal of chemically modifying the substrate surface and thereby… read more here.
Keywords: aluminum induced; crystallization; induced crystallization; plasma treatment ... See more keywords