Surface texture of single-crystal silicon oxidized under a thin V2O5 layer
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DOI: 10.1134/s106378261701016x
Abstract: The process of surface texturing of single-crystal silicon oxidized under a V2O5 layer is studied. Intense silicon oxidation at the Si–V2O5 interface begins at a temperature of 903 K which is 200 K below than… read more here.
Keywords: layer; single crystal; crystal silicon; silicon ... See more keywords