Numerical simulation of polysilicon deposition characteristics in chemical vapor deposition process
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DOI: 10.2298/tsci171009057a
Abstract: This paper addresses the complex component evolution and silicon dynamic deposition characteristics in the traditional Siemens reactor. A two-dimensional heat and mass transfer model coupled with a detailed chemical reaction mechanism was developed. The distributions… read more here.
Keywords: polysilicon deposition; simulation polysilicon; numerical simulation; characteristics chemical ... See more keywords