Electrical properties of nanostructured SiN films for MEMS capacitive switches
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Micromechanics and Microengineering"
DOI: 10.1088/0960-1317/27/1/014001
Abstract: The electrical properties of gold nanorods nanostructured silicon nitride films are comprehensively investigated with the aid of metal–insulator–metal capacitors and RF MEMS capacitive switches. Different nanorod diameters and densities were grown on the bottom electrode… read more here.
Keywords: sin films; properties nanostructured; mems capacitive; capacitive switches ... See more keywords
Evaluation of plasma process-induced mechanical property change in SiN films using a cyclic nanoindentation technique
Sign Up to like & getrecommendations! Published in 2024 at "Journal of Physics D: Applied Physics"
DOI: 10.1088/1361-6463/ad6faf
Abstract: Recently, plasma process-induced damage (PID) has garnered significant interest in the design of thin dielectric films implemented in semiconductor devices. Silicon nitride (SiN) films, a material of interest in strain engineering, are found to suffer… read more here.
Keywords: mechanical property; plasma process; sin films; sin ... See more keywords