Colloidal Crack Sintering Lithography for LightâInduced Patterning of Particle Assemblies
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DOI: 10.1002/adfm.202520056
Abstract: Photoinduced patterning can generate intricate topographic structures, but it relies heavily on specialized materials, which limits its general usability. Here, colloidal crack sintering lithography (CCSL) is introduced, a patterning method based simply on a commodity polymer… read more here.
Keywords: colloidal crack; sintering lithography; light; crack sintering ... See more keywords