Articles with "sinx" as a keyword



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Down-shifting Si-based layer for Si solar applications

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Published in 2017 at "Solar Energy Materials and Solar Cells"

DOI: 10.1016/j.solmat.2017.05.011

Abstract: SiNx and SiNx:Tb3+ thin layers were deposited by reactive magnetron co-sputtering with the objective of optimizing the light management in Si solar cells. Those Si-based layers are developed to be compatible with the Si-PV technology.… read more here.

Keywords: sinx; shifting based; layer; sinx tb3 ... See more keywords

Moisture barrier and bending properties of silicon nitride films prepared by roll-to-roll plasma enhanced chemical vapor deposition

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Published in 2018 at "Thin Solid Films"

DOI: 10.1016/j.tsf.2018.06.003

Abstract: Abstract In this study, we demonstrated a single-layer silicon nitride (SiNx) film deposited on polyethyleneterephthalate substrate as a moisture permeation barrier film that reduced the water vapor transmission rate (WVTR). The SiNx film was fabricated… read more here.

Keywords: sinx film; barrier; moisture; roll ... See more keywords

Characterization of SiNx:H thin film as a hydrogen passivation layer for silicon solar cells with passivated contacts

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Published in 2019 at "Thin Solid Films"

DOI: 10.1016/j.tsf.2019.02.016

Abstract: Abstract Silicon nitride (SiNx:H) films are generally used as passivation and anti-reflection layers in solar cells, and they are usually made by plasma-enhanced chemical vapor deposition (PECVD). Silicon nitride could act as a hydrogen diffusion… read more here.

Keywords: passivation; film; solar cells; silicon ... See more keywords
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The low-temperature remote-plasma-activated pulsed chemical vapor deposition route to SiNx from 1,3,5-tri(isopropyl)cyclotrisilazane

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Published in 2020 at "Thin Solid Films"

DOI: 10.1016/j.tsf.2020.138299

Abstract: Abstract High-quality silicon nitride (SiNx) thin films were grown by remote-plasma-activated pulsed chemical vapor deposition (P-CVD) from the source precursor 1,3,5-tri(isopropyl)cyclotrisilazane (TICZ, C9H27N3Si3) and remote ammonia (NH3) plasma on silicon oxide (SiO2) substrates within an… read more here.

Keywords: plasma; temperature; sinx; vapor ... See more keywords

Tailoring Mechanical and Optical Properties of Sputtered SiNx/BN Coatings.

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Published in 2024 at "ACS applied materials & interfaces"

DOI: 10.1021/acsami.4c10220

Abstract: The swift evolution of contemporary electronics products, such as flexible screens and wearable electronic devices, highlights the significance of flexible protective coatings, which combine superior mechanical and optical properties. Even though the recently developed polymer… read more here.

Keywords: sinx; properties sputtered; mechanical optical; tailoring mechanical ... See more keywords

A synaptic transistor with a stacked layer of SiNx and SiO2 deposited from hexamethyldisiloxane/O2

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Published in 2025 at "Applied Physics Letters"

DOI: 10.1063/5.0232721

Abstract: Herein, we employed inductively coupled plasma enhanced chemical vapor deposition using a hexamethyldisiloxane/O2 precursor to deposit SiO2 with electrical double layer capacitance on SiNx forming SiO2/SiNx stacked films as a dielectric layer, achieving high-performance synaptic… read more here.

Keywords: sinx; spectroscopy; transistor; sio2 deposited ... See more keywords
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Resolving the debated atomic structure of the metastable cubic SiNx tissue phase in nanocomposites with TiN

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Published in 2018 at "Physical Review Materials"

DOI: 10.1103/physrevmaterials.2.093608

Abstract: The TiN/SiNx nanocomposite and nanolaminate systems are the archetype for super if not ultrahard materials. Yet, the nature of the SiNx tissue phase is debated. Here, we show by atomically resolved ... read more here.

Keywords: resolving debated; tissue phase; sinx; sinx tissue ... See more keywords

Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma

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Published in 2019 at "Applied Sciences"

DOI: 10.3390/app9173531

Abstract: Silicon nitride (SiNx) thin films using 1,3-di-isopropylamino-2,4-dimethylcyclosilazane (CSN-2) and N2 plasma were investigated. The growth rate of SiNx thin films was saturated in the range of 200–500 °C, yielding approximately 0.38 Å/cycle, and featuring a… read more here.

Keywords: plasma; sinx; step; remote plasma ... See more keywords

Improvement of GaN crystalline quality by SiNx layer grown by MOVPE

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Published in 2020 at "Lithuanian Journal of Physics"

DOI: 10.3952/physics.v59i4.4134

Abstract: In this work the mechanism which helps to reduce the dislocation density by deposition of a SiNx interlayer is discussed. It is shown that the dislocation reduction by SiNx interlayer deposition is influenced by dislocation… read more here.

Keywords: sinx interlayer; dislocation; dislocation density; sinx ... See more keywords