Low-temperature deposition of SiNx, SiOxNy, and SiOx films from plasma discharge of SiH4 for polycarbonate glazing applications
Sign Up to like & getrecommendations! Published in 2017 at "Thin Solid Films"
DOI: 10.1016/j.tsf.2017.04.022
Abstract: Abstract To improve the abrasion resistance of polycarbonate, which can be used as a replacement for glass, SiNx, SiOxNy, and SiOx thin films were deposited at low temperatures using a slot antenna electron cyclotron resonance… read more here.
Keywords: deposition; sinx sioxny; abrasion; sioxny siox ... See more keywords
Thin film encapsulation for quantum dot light-emitting diodes using a-SiNx:H/SiOxNy/hybrid SiOx barriers
Sign Up to like & getrecommendations! Published in 2022 at "RSC Advances"
DOI: 10.1039/d1ra07712k
Abstract: A facile thin film encapsulation (TFE) method having a triple-layered structure of a-SiNx:H/SiOxNy/hybrid SiOx (ASH) on QD-LEDs was performed utilizing both reproducible plasma-enhanced chemical vapor deposition (PECVD) and simple dip-coating processes without adopting atomic layer… read more here.
Keywords: hybrid siox; film encapsulation; encapsulation; sioxny hybrid ... See more keywords