Fabrication of 3D SiO x structures using patterned PMMA sacrificial layer
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DOI: 10.1088/1361-6439/aa935b
Abstract: Three-dimensional (3D) nanofabrication based on electron-beam lithography (EBL) has drawn wide attention for various applications with its high patterning resolution and design flexibility. In this work, we present a bilayer EBL process to obtain 3D… read more here.
Keywords: sacrificial layer; sio structures; fabrication sio; freestanding sio ... See more keywords