Study of SiGe oxidation kinetics for preferential SiO2 formation under a low O2 pressure condition
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DOI: 10.1063/1.5009758
Abstract: We have studied the oxidation kinetics of SiGe as parameters of O2 pressure and temperature. This paper first discusses the SiGe oxidation experimentally and thermodynamically. It was found that Si was predominantly oxidized in the… read more here.
Keywords: sio2 formation; oxidation; sige oxidation; formation ... See more keywords