Revised parametrization of the recombination velocity at SiO2/SiNx-passivated phosphorus-diffused surfaces
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DOI: 10.1016/j.solmat.2021.111292
Abstract: Abstract We investigate the effective surface recombination velocity Seff of alkaline textured, Phosphorus-diffused and thermal SiO2/SiNx passivated surfaces with an emphasis on the impact of the thermal oxidation temperature. The application of a recent calibration… read more here.
Keywords: sio2 sinx; recombination; sinx passivated; phosphorus diffused ... See more keywords