Synergistic effects in MOS capacitors with an Au/HfO2–SiO2/Si structure irradiated with neutron and gamma ray
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DOI: 10.1088/1361-6463/ac3ce8
Abstract: The properties of oxide trapped charges and interface state density in the metal oxide semiconductor (MOS) capacitors with an Au/HfO2–SiO2/Si structure were investigated under irradiation of 14 MeV neutron and 60Co gamma-ray. In the mixed… read more here.
Keywords: mos capacitors; sio2 structure; capacitors hfo2; hfo2 sio2 ... See more keywords