Optimization of a SiOx/SiNxOyCz multilayer structure for a reliable gas diffusion barrier via low-temperature plasma-enhanced atomic layer deposition
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DOI: 10.1016/j.ceramint.2019.01.027
Abstract: Abstract Thin film encapsulation (TFE) using a multilayer film composed of SiOx and SiNxOyCz layers deposited by plasma-enhanced atomic layer deposition is demonstrated. To investigate the mechanism of suppressed moisture penetration for the multilayer film,… read more here.
Keywords: siox sinxoycz; plasma enhanced; multilayer film; layer ... See more keywords