Low-temperature deposition of SiNx, SiOxNy, and SiOx films from plasma discharge of SiH4 for polycarbonate glazing applications
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DOI: 10.1016/j.tsf.2017.04.022
Abstract: Abstract To improve the abrasion resistance of polycarbonate, which can be used as a replacement for glass, SiNx, SiOxNy, and SiOx thin films were deposited at low temperatures using a slot antenna electron cyclotron resonance… read more here.
Keywords: deposition; sinx sioxny; abrasion; sioxny siox ... See more keywords