Articles with "situ doped" as a keyword



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Soft conducting polymer hydrogels in situ doped by sulfonated graphene quantum dots for enhanced electrochemical activity

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Published in 2019 at "Journal of Materials Science: Materials in Electronics"

DOI: 10.1007/s10854-019-02739-2

Abstract: Electrode materials play a crucial role in determining the comprehensive performance of the constructed flexible supercapacitors. Herein, a simple synthesis method was reported to fabricate soft polypyrrole (PPy) hydrogels with in situ-doped sulfonated graphene quantum… read more here.

Keywords: graphene quantum; hydrogels situ; quantum dots; sgqd ... See more keywords
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Efficient degradation of bisphenol A via peroxydisulfate activation using in-situ N-doped carbon nanoparticles: Structure-function relationship and reaction mechanism.

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Published in 2020 at "Journal of colloid and interface science"

DOI: 10.1016/j.jcis.2020.10.120

Abstract: A novel in-situ N-doped carbon nanoparticles (NCNs) was prepared through direct pyrolysis of N-rich polyaniline (PANI) without using external N-containing precursor and the as-prepared materials were employed as metal-free peroxydisulfate (PDS) activator for bisphenol A… read more here.

Keywords: degradation; doped carbon; efficient degradation; carbon nanoparticles ... See more keywords
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Waste-honeycomb-derived in situ N-doped Hierarchical porous carbon as sulfur host in lithium-sulfur battery.

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Published in 2022 at "Dalton transactions"

DOI: 10.1039/d1dt03705f

Abstract: Promising applications of lithium-sulfur batteries with high theoretical capacity are still severely limited due to the poor conductivity of sulfur, the polysulfide shuttle effect and volume expansion. Herein, low-cost and carbon/nitrogen-rich waste honeycombs are used… read more here.

Keywords: hierarchical porous; carbon; sulfur host; situ doped ... See more keywords
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Threshold Voltage Engineering of Enhancement-Mode AlGaN/GaN Metal-Oxide-Semiconductor High Electron Mobility Transistors with Different Doping Concentration of In Situ Cl− Doped Al2O3

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Published in 2021 at "ECS Journal of Solid State Science and Technology"

DOI: 10.1149/2162-8777/ac12b7

Abstract: This work used mist chemical vapor deposition to deposit an in-situ Cl— doped Al2O3 film. 0.05 vol%, 0.1 vol%, and 0.15 vol% HCl were added to the precursor solutions for Cl— doping. The recess and… read more here.

Keywords: doped al2o3; threshold voltage; enhancement mode; voltage ... See more keywords