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Published in 2017 at "Journal of Magnetism and Magnetic Materials"
DOI: 10.1016/j.jmmm.2017.07.057
Abstract: Abstract Remote plasma sputtering (RPS) offers a high degree of control over the sputtering parameters used to deposit thin metallic films and has demonstrated a capability to control the media grain size distribution. Narrow grain…
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Keywords:
remote plasma;
size;
grain size;
size fept ... See more keywords