Repairing slight damages on monocrystalline silicon surface by thermal annealing
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DOI: 10.1088/2053-1591/abf2ea
Abstract: The damages on silicon substrate, usually caused by machining and polishing processes, inevitably degrade the mechanical and electrical properties of the devices involved. Defect-free silicon substrates are essential with the miniaturization of integrated circuits to… read more here.
Keywords: monocrystalline silicon; slight damages; repairing slight; surface ... See more keywords