Making thick photoresist SU-8 flat on small substrates
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DOI: 10.1088/1361-6439/aaed1c
Abstract: This work suggests a simple method to flatten thick layers (similar to 50-200 mu m) of SU-8 photoresist on small substrates (similar to 1 cm). The method sidesteps the edge beads problem and enables photolithography… read more here.
Keywords: small substrates; photoresist flat; making thick; photoresist ... See more keywords