Simple Isopropanol-Assisted Direct Soft Imprint Lithography for Residue-Free Microstructure Patterning.
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DOI: 10.1021/acsami.4c05841
Abstract: A direct soft imprint lithography was proposed to realize the direct fabrication of residue-free, well-shaped functional patterns through a single step. This imprint method requires only a simply prepared isopropanol-treated polydimethylsiloxane (PDMS) stamp without any… read more here.
Keywords: imprint; soft imprint; residue free; isopropanol ... See more keywords