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Published in 2017 at "Microelectronic Engineering"
DOI: 10.1016/j.mee.2017.03.002
Abstract: A promising release technique for SU-8 using a water-soluble sacrificial layer based on germanium oxide is developed. The relatively high etching rate of germanium oxide in water and its high etching selectivity make it suitable…
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Keywords:
water;
water soluble;
sacrificial layer;
using water ... See more keywords