Initiative global NILS control in source and mask optimization for process window enhancement.
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DOI: 10.1364/ao.482501
Abstract: Semiconductor processing is becoming more challenging as integrated circuit dimensions shrink. An increasing number of technologies are being developed for the purpose of ensuring pattern fidelity, and source and mask optimization (SMO) method has outstanding… read more here.
Keywords: mask optimization; source mask; mask; process window ... See more keywords
Lithographic source and mask optimization with narrow-band level-set method.
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DOI: 10.1364/oe.26.010065
Abstract: Source and mask optimization (SMO) remains a key technique to improve the wafer image printability for technology nodes of 22 nm and beyond, enabling the continuation of the immersion lithography. In this paper, we propose… read more here.
Keywords: source mask; optimization; level set; narrow band ... See more keywords
Source and mask optimizing with a defocus antagonism for process window enhancement.
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DOI: 10.1364/oe.469275
Abstract: With the continuous reduction of critical dimension (CD) of integrated circuits, inverse lithography technology (ILT) is widely adopted for the resolution enhancement to ensure the fidelity of photolithography, and for the process window (PW) improvement… read more here.
Keywords: process window; process; source mask; dof ... See more keywords