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   Articles with "source mask" as a keyword



Initiative global NILS control in source and mask optimization for process window enhancement.

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recommendations! Published in 2023 at "Applied optics"

DOI: 10.1364/ao.482501

Abstract: Semiconductor processing is becoming more challenging as integrated circuit dimensions shrink. An increasing number of technologies are being developed for the purpose of ensuring pattern fidelity, and source and mask optimization (SMO) method has outstanding… read more here.

Keywords: mask optimization; source mask; mask; process window ... See more keywords

Full-field source and mask optimization using gradient surgery strategy.

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recommendations! Published in 2025 at "Applied optics"

DOI: 10.1364/ao.555666

Abstract: The aberrations of the lithography objective are unevenly distributed at different field points. Full-field source and mask optimization (FFSMO) can reduce the impact of uneven aberration on projection lithography imaging. However, gradient conflicts between field… read more here.

Keywords: source mask; field; field source; full field ... See more keywords

Lithographic source and mask optimization with narrow-band level-set method.

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recommendations! Published in 2018 at "Optics express"

DOI: 10.1364/oe.26.010065

Abstract: Source and mask optimization (SMO) remains a key technique to improve the wafer image printability for technology nodes of 22 nm and beyond, enabling the continuation of the immersion lithography. In this paper, we propose… read more here.

Keywords: source mask; optimization; level set; narrow band ... See more keywords

Source and mask optimizing with a defocus antagonism for process window enhancement.

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recommendations! Published in 2022 at "Optics express"

DOI: 10.1364/oe.469275

Abstract: With the continuous reduction of critical dimension (CD) of integrated circuits, inverse lithography technology (ILT) is widely adopted for the resolution enhancement to ensure the fidelity of photolithography, and for the process window (PW) improvement… read more here.

Keywords: process window; process; source mask; dof ... See more keywords

Source and mask optimization for stability of reticle and wafer stages.

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recommendations! Published in 2024 at "Optics express"

DOI: 10.1364/oe.535075

Abstract: The relative motion of the reticle stage and wafer stage caused by vibration during the scanning exposure process of the lithography machine is an important factor that affects the imaging quality under limited lithography ability.… read more here.

Keywords: mask optimization; reticle; stage; lithography ... See more keywords