Reducing dose sensitivity in high-numerical-aperture extreme ultraviolet lithography using an innovative source optimization method.
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DOI: 10.1364/ao.555171
Abstract: Errors such as illumination non-uniformity and system drift during scanning can lead to unpredictable dose non-uniformity and degrade the imaging performance across the wafer. This paper proposes a novel, to our knowledge, source optimization (SO)… read more here.
Keywords: aperture extreme; high numerical; source optimization; extreme ultraviolet ... See more keywords