Transient analysis and process optimization of the spatial atomic layer deposition using the dynamic mesh method
Sign Up to like & getrecommendations! Published in 2020 at "Chemical Engineering Science"
DOI: 10.1016/j.ces.2020.115513
Abstract: Abstract Spatial atomic layer deposition (ALD) is acknowledged as a high-throughput thin film preparation technique. Since the films are obtained at a high relative velocity of the substrate, the dynamic flow field distribution is more… read more here.
Keywords: spatial atomic; mesh method; dynamic mesh; atomic layer ... See more keywords
Computational fluid dynamics modeling of spatial atomic layer deposition on microgroove substrates
Sign Up to like & getrecommendations! Published in 2021 at "International Journal of Heat and Mass Transfer"
DOI: 10.1016/j.ijheatmasstransfer.2021.121854
Abstract: Abstract Spatial atomic layer deposition (ALD) is a promising high-throughput technique capable of producing ultrathin films on large substrates. Compared to flat wafers, deposition on substrates with microstructures has a wider range of applications such… read more here.
Keywords: spatial atomic; atomic layer; fluid dynamics; layer deposition ... See more keywords
Efficiency improvement of PERC solar cell using an aluminum oxide passivation layer prepared via spatial atomic layer deposition and post-annealing
Sign Up to like & getrecommendations! Published in 2019 at "Surface and Coatings Technology"
DOI: 10.1016/j.surfcoat.2018.12.016
Abstract: Abstract In this study, Al2O3 thin films are deposited on p-type silicon using spatial atomic layer deposition with trimethylaluminum and H2O. The films are annealed in atmosphere (ATM), forming gas (FG) and nitrogen (N2) at… read more here.
Keywords: passivation; spatial atomic; layer; cell ... See more keywords