In-situ control of molecular beam epitaxial growth by spectral reflectivity analysis
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DOI: 10.1016/j.jcrysgro.2020.125993
Abstract: Abstract The epitaxial growth of complex heterostructures requires in-situ techniques for detection and control of the growth parameters. In-situ continuous spectral reflectivity measurements are used during molecular beam epitaxial growth to measure the substrate temperature… read more here.
Keywords: growth; control; molecular beam; beam epitaxial ... See more keywords