STED-Inspired Laser Lithography Based on Photoswitchable Spirothiopyran Moieties
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DOI: 10.1021/acs.chemmater.8b04696
Abstract: We introduce a photoresist based on methacrylate copolymers bearing photochromic spirothiopyran moieties as side groups that can crosslink via supramolecular interaction between the chromophores. Upon two-photon excitation, the resist is capable of generating freestanding three-dimensional… read more here.
Keywords: laser lithography; inspired laser; spirothiopyran moieties;