Status monitoring of ion sputter relevant parameters of an XPS depth profiling instrument
Sign Up to like & getrecommendations! Published in 2020 at "Surface and Interface Analysis"
DOI: 10.1002/sia.6765
Abstract: An X‐ray photoelectron spectroscopy (XPS) instrument is utilized for sputter depth profiling of thin films. Relevant instrumental parameters are the ion gun sputter rate, the contamination level of the sputter ion gun, and the purity… read more here.
Keywords: instrument; sputter; ion gun; depth profiling ... See more keywords
Effects of Process Parameters on the Microstructural Characteristics of DC Magnetron Sputtered Molybdenum Films on Graphite Substrate
Sign Up to like & getrecommendations! Published in 2020 at "Arabian Journal for Science and Engineering"
DOI: 10.1007/s13369-020-04888-7
Abstract: Graphite, due to its extreme purity and high-temperature stability, is considered as the material of choice for nuclear fusion reactors. However, it undergoes rapid oxidation and erosion at extreme environmental conditions like those experienced by… read more here.
Keywords: films graphite; temperature; sputter; graphite substrate ... See more keywords
Demonstration of lateral epitaxial growth of AlN on Si (1 1 1) at low temperatures by pulsed reactive sputter epitaxy
Sign Up to like & getrecommendations! Published in 2021 at "Journal of Crystal Growth"
DOI: 10.1016/j.jcrysgro.2021.126250
Abstract: Abstract We present a pulsed reactive magnetron sputter process for high quality AlN on Si (1 1 1) beneficially avoiding any high-temperature growth. Initially, metallic aluminium with a nominal thickness of about one monolayer is deposited at… read more here.
Keywords: growth; microscopy; pulsed reactive; sputter ... See more keywords
Electronic properties and transformation kinetics of two prominent metastable defects introduced in GaAs during sputter deposition of Au Schottky contacts
Sign Up to like & getrecommendations! Published in 2019 at "Materials Science in Semiconductor Processing"
DOI: 10.1016/j.mssp.2019.04.012
Abstract: Abstract Au Schottky barrier contacts (SBDs) were DC sputter deposited on Si doped n-type GaAs at a power of 150 W. Deep-level transient spectroscopy (DLTS) and Laplace DLTS were used to characterize the sputter-induced defects near… read more here.
Keywords: schottky; sputter; properties transformation; transformation kinetics ... See more keywords
On the crystallization behavior of sputter-deposited a-Si films on 4H-SiC
Sign Up to like & getrecommendations! Published in 2020 at "Thin Solid Films"
DOI: 10.1016/j.tsf.2020.137837
Abstract: Abstract The crystallization behavior of sputter-deposited amorphous silicon (a-Si) films on 4H-SiC by post-deposition annealing (PDA) is investigated. Film thicknesses between 100 and 1500 nm were selected. PDA was carried out at temperatures between 800 and… read more here.
Keywords: films sic; sputter deposited; sputter; microscopy ... See more keywords
‘Planetary’ silver nanoparticles originating from a magnetron sputter plasma
Sign Up to like & getrecommendations! Published in 2018 at "Journal of Physics D: Applied Physics"
DOI: 10.1088/1361-6463/aaf783
Abstract: After my PhD in Physics in 2003 on the "Switchable mirror" at Utrecht University, The Netherlands, I obtained a rich international postdoctoral experience with an emphasis on nanoparticles. After working on various topics such as… read more here.
Keywords: planetary silver; silver nanoparticles; sputter; thin film ... See more keywords
Reactive Magnetron Sputter Deposition of Superconducting Niobium Titanium Nitride Thin Films With Different Target Sizes
Sign Up to like & getrecommendations! Published in 2017 at "IEEE Transactions on Applied Superconductivity"
DOI: 10.1109/tasc.2016.2631939
Abstract: The superconducting critical temperature (Tc > 15 K) of niobium titanium nitride (NbTiN) thin films allows for low-loss circuits up to 1.1 THz, enabling on-chip spectroscopy and multipixel imaging with advanced detectors. The drive for… read more here.
Keywords: thin films; sputter; niobium titanium; target ... See more keywords
Variation in plutonium dioxide sputter yields for 1–5 keV Ar+ ions
Sign Up to like & getrecommendations! Published in 2020 at "Journal of Vacuum Science and Technology"
DOI: 10.1116/6.0000301
Abstract: An oxide layer with a known thickness and chemistry was grown on delta stabilized Pu and sputtered with 1–5 keV Ar+ ions over a range of incident ion angle between 22° and 72°. From the time… read more here.
Keywords: ion angle; variation plutonium; kev ions; sputter ... See more keywords